Anfatec Instruments AG

Measurement Science and Technology &
Scanning Probe Microscopy

• defined height steps of 58 nm checked with TEM cross section

• lateral  overview calibration for smaller scan ranges

This grating was developed for the height calibration of scanners, however, its chess pattern like structure makes it suitable for the lateral calibration, too.

• Type / material

• typical height

• depth calibration 

• centre of the grating

  • Pitch*

  • dimensions

•   edge of the grating

  • pitch x

  • pitch y

• active area

Si-Substrate / SiO - Layer 
58 nm +/- 2 nm 
TEM cross section

2 µm x 2 µm (chess pattern 1 µm x 1 µm) 
0,4 mm x 0,4 mm 

2 µm Si/ 2 µm SiO (pitch: 4 µm) 
2 µm Si/ 100 µm SiO 
2,4 mm x 2,4 mm